http://www.3915.jp/hp03/ http://www.3915.jp/hp03/4484.html <ul><li>2005 vintage<li>Detail detectability : 0.4μm-3μm <li>Filament type : High brightness type Lab6 chip <li>Max. resolution(micro chart) : 0.4μm(JIMA chart) <li>X-ray output : Tube voltage : 40-120kV/Tube current : 0-200…</li></li></li></li></li></ul> Semiconductor Equipment Tanaka Corporation 2010-07-30T15:05:09+09:00 http://www.3915.jp/hp03/4479.html Item configuration<ul><li>Measuring body</li><li>Control unit box</li><li>Use for electrochemistry C-V profiler</li></ul><a href="http://www.3915.jp/hp03/file/5582.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="ACCENT／ElectrochemicalC-VProfiler／PN4300PC-Ref.No.02221" src="http://www.3915.jp/hp03/file/s5582.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5584.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="ACCENT／ElectrochemicalC-VProfiler／PN4300PC-Ref.No.02221" src="http://www.3915.jp/hp03/file/s5584.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5583.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="ACCENT／ElectrochemicalC-VProfiler／PN4300PC-Ref.No.02221" src="http://www.3915.jp/hp03/file/s5583.jpg" width="160" height="120"></a>      Scientific Equipment Tanaka Corporation 2010-07-26T14:10:14+09:00 http://www.3915.jp/hp03/4474.html Particle Senser : KS-40A<ul><li>Optical system : Light-scattering method <li>Light source : Laser diode(wavelength 830nm) <li>Light detector : PIN type photodiode <li>Materials of parts exposed to sample : Synthetic quar…</li></li></li></li></ul> Scientific Equipment Tanaka Corporation 2010-07-22T17:06:40+09:00 http://www.3915.jp/hp03/4466.html <ul><li>Laser beam light source waveform for measurement : Bio red laser 408nm(JIS class 2) <li>Range of height measurement : 7mm <li>Minimum resolution for horizontal measurement : 0.01μm <li>Frame memory(For color vide…</li></li></li></li></ul> Microscopes Tanaka Corporation 2010-07-15T17:28:11+09:00 http://www.3915.jp/hp03/4458.html <ul><li>Image Receiving Element : 1/2 inch 2.11 million-pixcel CCD image sensor <li>Frame Rate : 7.5F/S, 30F/S selectable <li>LCD Monitor : Color(TFT) 15 inch <li>Used disk : CD-R/CD-RW <li>HDD Storage Capacity : 120GB <li>Inter…</li></li></li></li></li></li></ul> Microscopes Tanaka Corporation 2010-07-15T13:04:25+09:00 http://www.3915.jp/hp03/4438.html <ul><li>Laser beam light source for measurement : Waveform: 685nm <li>Range of height measurement : 7mm <li>Minimum resolution for height measurement : 0.01 μm <li>Frame memory(For color video) : 1024 x 768 x 8bit x 3 <li>Fr…</li></li></li></li></li></ul> Microscopes Tanaka Corporation 2010-07-06T10:15:18+09:00 http://www.3915.jp/hp03/4406.html <ul><li>System : Single vessel type</li><li>Control Mode : Unsaturated control, Wet saturated control, Wet and dry bulb temperature control</li><li>Unsaturated Control : 1)Temperature range: +105.0 to 142.9 deg, 2)Humidity con…</li></ul> Chambers Tanaka Corporation 2010-06-08T17:02:20+09:00 http://www.3915.jp/hp03/4402.html <ul><li>2002 vintage <li>Abrasive : #220-#800 <li>Processing Work : 150 x 150mm  <li>Spray Mechanism : Constant feeding device<li>Circulation Mechanism : Separation of foreign materials, Special cyclone device</li></ul><a href="http://www.3915.jp/hp03/file/5278.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="Shintokogio／Micro Blaster／MB1-ML-029 Ref.No.03023" src="http://www.3915.jp/hp03/file/s5278.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5279.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="Shintokogio／Micro Blaster／MB1-ML-029 Ref.No.03023" src="http://www.3915.jp/hp03/file/s5279.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5280.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="Shintokogio／Micro Blaster／MB1-ML-029 Ref.No.03023" src="http://www.3915.jp/hp03/file/s5280.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5281.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="Shintokogio／Micro Blaster／MB1-ML-029 Ref.No.03023" src="http://www.3915.jp/hp03/file/s5281.jpg" width="160" height="120"></a>  <a href="http://www.3915.jp/hp03/file/5282.jpg" target="_blank"><img class="pict" border="0" hspace="3" alt="Shintokogio／Micro Blaster／MB1-ML-029 Ref.No.03023" src="http://www.3915.jp/hp03/file/s5282.jpg" width="120" height="160"></a>   </li></li></li></li></ul> Others Tanaka Corporation 2010-06-03T16:36:00+09:00 http://www.3915.jp/hp03/4398.html It is possible to do IC chip backside griding, wafer frontside film grinding, and multilayer pattern griding.<ul><li>Griding Plate Revolution : 10-490 RPM <li>Sample Mouting Unit : Heat / cool unit(110 deg max.),…</li></li></ul> Others Tanaka Corporation 2010-06-03T13:51:27+09:00 http://www.3915.jp/hp03/4397.html <ul><li>Temperature Range : -40 deg to +100 deg <li>Humidity Range : 20-98%RH <li>Inside Dimension : W1000 X H1000 X D800(mm) <li>Outside Dimension : W1410 X H1840 X D1173(mm) <li>Weight : 540kg <li>Power Supply : AC200V 3φ 50/6…</li></li></li></li></li></li></ul> Chambers Tanaka Corporation 2010-06-03T13:38:07+09:00 http://www.3915.jp/hp03/4200.html <ul><li>2006 vintage</li><li>Volume : About 480L</li><li>Inside Dimension : H1190 X W570 X L850(mm)</li><li>Outside Dimention : H1370 X W800 X L1930(mm)</li><li>Salt Tank Capacity : 180L</li><li>Temperature Range : (Salt spray test) Surrounding temperat…</li></ul> Chambers Tanaka Corporation 2010-04-22T17:01:07+09:00 http://www.3915.jp/hp03/4199.html <ul><li>Temperature Range : -40 deg to +180 deg</li><li>Inside Demension : W450 X H400 X D750(mm)</li><li>Outside Dimension : W800 X H1780 X D1250(mm)</li><li>Wight : 420kg</li><li>Power Supply : AC200V 3φ 50Hz 32A</li><li>2004 vintage</li><li>Shelves : 0 sets</li><li>Ca…</li></ul> Chambers Tanaka Corporation 2010-04-22T16:15:05+09:00 http://www.3915.jp/hp03/4195.html <ul><li>Temperature Range : -70℃~+150℃ <li>Humidity Range : 20~98%RH <li>Inside Dimension : W600 X H850 X D600(mm) <li>Outside Dimension : W1010 X H1690 X D1173(mm) <li>Weight : 400kg <li>Power Supply : AC200V 3φ 50/60Hz 32A <li>200…</li></li></li></li></li></li></li></ul> Chambers Tanaka Corporation 2010-04-21T14:06:14+09:00 http://www.3915.jp/hp03/4134.html <ul><li>Lap Plate Diameter Max.(Outside Diameter x Inside Diameter) : φ380mm x φ140mm</li></ul>*Lap plate attached now is φ300 x φ100mm.<ul><li>Motor : 1.5kW, 200V, 3 phases</li><li>Revolution(rpm) : 0-343rpm</li><li>Facing Function : No</li><li>Dimensi…</li></ul> Others Tanaka Corporation 2010-04-14T13:22:40+09:00 http://www.3915.jp/hp03/4133.html <ul><li>Baring : Ball baring <li>Min. Torque Range : 250 μNm <li>Min. Torque Range : 150 mNm <li>Torque Resolution : &lt; 0.1 μNm <li>Measurement Displacement Angle : 0.1~∞ μrad  <li>Revolution Range (Setting) : 10-5~1200/3000 (1/m…</li></li></li></li></li></li></ul> Scientific Equipment Tanaka Corporation 2010-04-14T13:22:25+09:00 http://www.3915.jp/hp03/4132.html <ul><li>Work Specifications: Element : □0.25-□3 (mm) <li>Substrate : Si, Ceramic etc  Max. about 10mm <li>Tray for Element : 2 inches tray <li>XY Stage : X200mm X Y200mm <li>Substrate Stage : 25mm X 25mm  Vacuum adsorption s…</li></li></li></li></li></ul> Semiconductor Equipment Tanaka Corporation 2010-04-14T13:22:06+09:00 http://www.3915.jp/hp03/4131.html <ul><li>2003 vintage <li>Max. Processing Diameter : 150mm <li>Work Axis Left and Right Movement : 50mm <li>Whetstone Axis Back and Forth Movement : 25mm <li>Max. Whetstone Diameter : 200mm  <li>Whetstone Rotation Speed : 2200rpm…</li></li></li></li></li></li></ul> Others Tanaka Corporation 2010-04-14T13:21:52+09:00 http://www.3915.jp/hp03/4128.html <ul><li>Eutectic Pin Set Die Bonder <li>Bonding Style : Eutectic bonding style (heat+load+scrub) <li>Load : Changeable from 5 to 150g <li>Chip Pickup Style : Air pin set style <li>Scrub Cycle : 0-9 scales, 10 stages changeab…</li></li></li></li></li></ul> Semiconductor Equipment Tanaka Corporation 2010-04-14T13:21:02+09:00 http://www.3915.jp/hp03/4127.html <ul><li>Sample Size : Dealing with 4,5,6 inches wafer <li>Mask, Wafer Fixed Method : Vacuum adsorption <li>Light Source : Ushio HB-25103BY-C(250W super high-pressure mercury-vapor lamp) <li>Main Wavelength : 365nm, 405nm…</li></li></li></li></ul> Semiconductor Equipment Tanaka Corporation 2010-04-14T13:20:46+09:00 http://www.3915.jp/hp03/4126.html <ul><li>Gas : XEF2 <li>Security : Emergency stop switch, Leakage sensor, Gas detector <li>Touch Panel Operation (Gas line, Exhaust line, Bulb, Display for valve) <li>Robot Carrier(Front room-Robot room-Reaction room) <li>Vac…</li></li></li></li></li></ul> Semiconductor Equipment Tanaka Corporation 2010-04-14T13:20:30+09:00