Used semiconductor & Scientific equipment, ISO14001 certified

Japanese

Tanaka Corporation

NANOTEC／Mask Aligner／ES20OS Ref.No.02934
  • Sample Size : Dealing with 4,5,6 inches wafer
  • Mask, Wafer Fixed Method : Vacuum adsorption
  • Light Source : Ushio HB-25103BY-C(250W super high-pressure mercury-vapor lamp)
  • Main Wavelength : 365nm, 405nm, 436nm
  • Lamp House : Ushio ML-251D/B
  • Integrating Luminous Energy Monitor : San-ei electric UVM-SP-JW
  • Z Axis Counter : Mitsutoyo EH-10P
  • Camera(5X) is attached, so it is possible to adjust position accurately with manual operation.
  • You can set light time with timer.
  • Controling contact with mask and wafer using z axis counter.
  • You can cotrol adsorption and vacuum destruction easily.
  • Air style vibration isolation system is attached.
  • Protection glasses are attached.
  • Power Supply : AC100V 50/60Hz

NANOTEC／Mask Aligner／ES20OS Ref.No.02934   NANOTEC／Mask Aligner／ES20OS Ref.No.02934   NANOTEC／Mask Aligner／ES20OS Ref.No.02934  
NANOTEC／Mask Aligner／ES20OS Ref.No.02934   NANOTEC／Mask Aligner／ES20OS Ref.No.02934   NANOTEC／Mask Aligner／ES20OS Ref.No.02934